Substrate-induced effects in thin films of a potential magnet composed of metal-free organic radicals deposited on Si(111).

We deposit a paramagnetic pyrene derivative of the nitronyl nitroxide radical on Si(111). The molecules experience a strong chemical interaction with the substrate that influences the film growth. We also study the time evolution of the nitronyl nitroxide radical under a micro-focused soft X-ray beam, observing a stable radical as a product. This result hints at the possibility of using this class of materials in dosimeters and sensors.